Atomic-layer deposited barrier and seed layers for interconnects

Schuhmacher, JorgJorgSchuhmacherMartin Hoyas, AnaAnaMartin HoyasSatta, AlessandraAlessandraSattaMaex, KarenKarenMaex2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11181Atomic-layer deposited barrier and seed layers for interconnectsBook chapter