Low-frequency-noise-based oxide trap profiling in replacement high-k/metal gate pMOSFETs

Simoen, EddyEddySimoenLee, Jae WooJae WooLeeVeloso, AnabelaAnabelaVelosoParaschiv, VasileVasileParaschivHoriguchi, NaotoNaotoHoriguchiClaeys, CorCorClaeys2021-10-222021-10-2220142162-8769https://imec-publications.be/handle/20.500.12860/24531Low-frequency-noise-based oxide trap profiling in replacement high-k/metal gate pMOSFETsJournal articlehttp://jss.ecsdl.org/content/3/6/Q127.abstract?etoc