Stortelder, JetskeJetskeStortelderEbeling, Robert P.Robert P.EbelingRijnsent, CorneCorneRijnsentvan Putten, MichelMichelvan Puttende Rooij-Lohmann, VeroniqueVeroniquede Rooij-LohmannSmit, MaximilianMaximilianSmitStorm, Arnold J.Arnold J.StormKoster, NorbertNorbertKosterLensen, Henk A.Henk A.LensenPhilipsen, VickyVickyPhilipsenOpsomer, KarlKarlOpsomerThakare, DeveshDeveshThakareFeigl, TorstenTorstenFeiglNaujok, PhilippPhilippNaujok2022-06-232022-05-222022-05-232022-06-232021978-1-5106-4552-30277-786XWOS:000792657300019https://imec-publications.be/handle/20.500.12860/39876First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materialsProceedings paper10.1117/12.2600928978-1-5106-4553-0WOS:000792657300019Materials sciencereticle, mask, absorber, EUV, optics lifetime, contamination control, accelerated life time tests, high-NA