Spacer defined FinFET: Active area patterning of sub-20 nm fins with high density

Degroote, BartBartDegrooteRooyackers, RitaRitaRooyackersVandeweyer, TomTomVandeweyerCollaert, NadineNadineCollaertBoullart, WernerWernerBoullartKunnen, EddyEddyKunnenShamiryan, DenisDenisShamiryanWouters, J.J.WoutersVan Puymbroeck, JanJanVan PuymbroeckDixit, AbhisekAbhisekDixitJurczak, GosiaGosiaJurczak2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12024Spacer defined FinFET: Active area patterning of sub-20 nm fins with high densityJournal article