Energy and spatial distributions of electron traps throughout Sio2/Al2O3 stacks as the IPD in flash memory application

Zheng, X.F.X.F.ZhengZhang, W.D.W.D.ZhangGovoreanu, BogdanBogdanGovoreanuRuiz Aguado, DanielDanielRuiz AguadoZhang, .F..F.ZhangVan Houdt, JanJanVan Houdt2021-10-192021-10-1920100018-9383https://imec-publications.be/handle/20.500.12860/18428Energy and spatial distributions of electron traps throughout Sio2/Al2O3 stacks as the IPD in flash memory applicationJournal article