Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance

Gao, WeiminWeiminGaoBlanco, VictorVictorBlancoPhilipsen, VickyVickyPhilipsenKamohara, ItaruItaruKamoharaSaad, YvesYvesSaadCiofi, IvanIvanCiofiMelvin, LawrenceLawrenceMelvinHendrickx, EricEricHendrickxWiaux, VincentVincentWiauxKim, Ryan Ryoung hanRyan Ryoung hanKim2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/28369Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistanceProceedings paper10.1117/12.2259964