Impact of CVD chemistry on band alignment at the MoS2/SiO2 interface

Tummala, P. P.P. P.TummalaDelie, GillesGillesDelieCataldo, A.A.CataldoGhomi, S.S.GhomiMartella, C.C.MartellaFerrini, G.G.FerriniMolle, A.A.MolleLamperti, A.A.LampertiAfanasiev, ValeriValeriAfanasiev2024-04-252023-10-272024-04-2520230038-1101WOS:001083770700001https://imec-publications.be/handle/20.500.12860/42984Impact of CVD chemistry on band alignment at the MoS2/SiO2 interfaceJournal article10.1016/j.sse.2023.108782WOS:001083770700001