Depas, MichelMichelDepasHeyns, MarcMarcHeynsNigam, TanyaTanyaNigamKenis, KarineKarineKenisSprey, HesselHesselSpreyWilhelm, H.H.WilhelmWilhelm, RudiRudiWilhelmCrossley, A.A.CrossleySofield, C. J.C. J.SofieldGräf, D.D.Gräf2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1203Critical processes for ultra-thin gate oxide integrityProceedings paper