Wu, MeiyiMeiyiWuThakare, DeveshDeveshThakareDe Marneffe, Jean-FrancoisJean-FrancoisDe MarneffeJaenen, PatrickPatrickJaenenSouriau, LaurentLaurentSouriauOpsomer, KarlKarlOpsomerSoulie, Jean-PhilippeJean-PhilippeSoulieErdmann, AndreasAndreasErdmannMesilhy, HazemHazemMesilhyNaujok, PhilippPhilippNaujokFoltin, MarkusMarkusFoltinSoltwisch, VictorVictorSoltwischSaadeh, QaisQaisSaadehPhilipsen, VickyVickyPhilipsen2022-02-212022-02-2120211932-5150WOS:000670414000004https://imec-publications.be/handle/20.500.12860/38955Study of novel EUVL mask absorber candidatesJournal article10.1117/1.JMM.20.2.021002WOS:000670414000004