New technique for forming continuous, smooth and uniform ultrathin (3nm) PtSi layers

Alves Donaton, RicardoRicardoAlves DonatonJin, S.S.JinBender, HugoHugoBenderConard, ThierryThierryConardDe Wolf, IngridIngridDe WolfMaex, KarenKarenMaexVantomme, AndreAndreVantommeLangouche, G.G.Langouche2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3181New technique for forming continuous, smooth and uniform ultrathin (3nm) PtSi layersJournal article