Limitation of HF-based chemistry for deep-submicron contact hole cleaning on silicides

Baklanov, MikhaïlMikhaïlBaklanovKondoh, EiichiEiichiKondohAlves Donaton, RicardoRicardoAlves DonatonVanhaelemeersch, SergeSergeVanhaelemeerschMaex, KarenKarenMaex2021-09-302021-09-301998https://imec-publications.be/handle/20.500.12860/2362Limitation of HF-based chemistry for deep-submicron contact hole cleaning on silicidesJournal article