Effect of deposition parameters and post-deposition treatments on the surface passivation obtained on crystalline silicon with ALD Al2O3

Loozen, XavierXavierLoozenVermang, BartBartVermangJohn, JoachimJoachimJohnBeaucarne, GuyGuyBeaucarnePoortmans, JefJefPoortmans2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14063Effect of deposition parameters and post-deposition treatments on the surface passivation obtained on crystalline silicon with ALD Al2O3Meeting abstractno