Exploring the optimal combination of Ru/Ta bilayer mask stacks and illumination source shapes to mitigate mask 3D effects at high-NA extreme ultraviolet lithography

Thakare, DeveshDeveshThakareDelabie, AnneliesAnneliesDelabiePhilipsen, VickyVickyPhilipsen2025-06-262024-11-162025-06-2620241094-4087WOS:001347681300010https://imec-publications.be/handle/20.500.12860/44789Exploring the optimal combination of Ru/Ta bilayer mask stacks and illumination source shapes to mitigate mask 3D effects at high-NA extreme ultraviolet lithographyJournal article10.1364/OE.522907WOS:001347681300010