Interfacial chemistry at high-k oxide layers on pretreated silicon wafers: XPS and TOF-SIMS study

Vitchev, R.R.VitchevConard, ThierryThierryConardBender, HugoHugoBenderHoussiau, L.L.HoussiauPireaux, J.J.J.J.Pireaux2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9881Interfacial chemistry at high-k oxide layers on pretreated silicon wafers: XPS and TOF-SIMS studyOral presentation