The lower boundary of the hydrogen concentration required for enhancing oxygen diffusion and thermal donor formation in Czochralski silicon

Huang, Y.L.Y.L.HuangMa, Y.Y.MaJob, R.R.JobFahrner, W.R.W.R.FahrnerSimoen, EddyEddySimoenClaeys, CorCorClaeys2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10620The lower boundary of the hydrogen concentration required for enhancing oxygen diffusion and thermal donor formation in Czochralski siliconJournal article