Wei, Chih-, IChih-, IWeiChen, Chao-HengChao-HengChenThakare, DeveshDeveshThakareLevinson, ZacharyZacharyLevinsonNge, Philip C. W.Philip C. W.NgeSchatz, JirkaJirkaSchatzWelling, UlrichUlrichWellingDawes, Andrew M. C.Andrew M. C.DawesHopped, WolfgangWolfgangHoppedDemmerle, WolfgangWolfgangDemmerleLiu, Ting-ChunTing-ChunLiuPreuninger, JuergenJuergenPreuningerYu, ZhiruZhiruYuKlosterman, UlrichUlrichKlostermanHwang, SoobinSoobinHwangKareem, PervaizPervaizKareemGillijns, WernerWernerGillijns2026-03-312026-03-312025978-1-5106-9320-30277-786Xhttps://imec-publications.be/handle/20.500.12860/58977engHigh-NA EUV Optical Proximity Correction Modeling Flow: from Data Preparation to Model ValidationProceedings paper10.1117/12.3072706WOS:001674167600025