Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond

Baudot, SylvainSylvainBaudotSoussou, AssawerAssawerSoussouMilenin, AlexeyAlexeyMileninErvin, JoeJoeErvinDemuynck, StevenStevenDemuynck2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/30217Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyondOral presentationhttps://www.spie.org/AL/conferencedetails/advances-resist-patterning-materials-processes