Plasma impact on the HfO2 high-k dielectric: Continuous-Wave plasma etch versus Quasi-Atomic Layer etch

Radisic, DunjaDunjaRadisicSmets, QuentinQuentinSmetsSchram, TomTomSchram2021-10-312021-10-312021https://imec-publications.be/handle/20.500.12860/37079Plasma impact on the HfO2 high-k dielectric: Continuous-Wave plasma etch versus Quasi-Atomic Layer etchMeeting abstract