Goethals, MiekeMiekeGoethalsVertommen, JohanJohanVertommenVan Roey, FriedaFriedaVan RoeyYen, AnthonyAnthonyYenTritchkov, AlexanderAlexanderTritchkovRonse, KurtKurtRonseJonckheere, RikRikJonckheereVan den hove, LucLucVan den hove2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1235Top-surface imaging and optical proximity correction: a way to 0.18 µm lithography at 248 nmProceedings paper