Improvement and evaluation of drying techniques for HF-last wafer cleaning

Li, LiLiLiZou, GangGangZouBender, HugoHugoBenderMertens, PaulPaulMertensMeuris, MarcMarcMeurisSchmidt, HaraldHaraldSchmidtHeyns, MarcMarcHeyns2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/230Improvement and evaluation of drying techniques for HF-last wafer cleaningProceedings paper