Low temperature SiGe steam oxide – aqueous HF and NH3/NF3 remote plasma etching and its implementation as Si GAA inner spacer

Wostyn, KurtKurtWostynKenis, KarineKarineKenisMertens, HansHansMertensVaisman Chasin, AdrianAdrianVaisman ChasinHikavyy, AndriyAndriyHikavyyHolsteyns, FrankFrankHolsteynsHoriguchi, NaotoNaotoHoriguchi2021-10-262021-10-262018https://imec-publications.be/handle/20.500.12860/32281Low temperature SiGe steam oxide – aqueous HF and NH3/NF3 remote plasma etching and its implementation as Si GAA inner spacerProceedings paperhttps://www.scientific.net/SSP.282.126