Leunissen, PeterPeterLeunissenPhilipsen, VickyVickyPhilipsenDe Ruyter, RudiRudiDe RuyterDemarteau, M.M.Demarteauvan de Kerkhof, M.M.van de Kerkhofde Boeij, WimWimde BoeijWaelpoel, J.J.WaelpoelMartin, PatrickPatrickMartinCangemi, MichaelMichaelCangemi2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10776Mask blank stress birefringence requirements for hyper-NA lithographyProceedings paper