Jonckheere, RikRikJonckheereVan Den Heuvel, DieterDieterVan Den HeuvelLamantia, MatthewMatthewLamantiaHermans, JanJanHermansHendrickx, EricEricHendrickxGoethals, MiekeMiekeGoethalsVandenberghe, GeertGeertVandenbergheRonse, KurtKurtRonse2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15549Investigation of mask defect density in full field EUV lithographyProceedings paper