Impact of hyper-NA reticle properties on ArF immersion lithography

Leunissen, PeterPeterLeunissenRonse, KurtKurtRonsePhilipsen, VickyVickyPhilipsenJonckheere, RikRikJonckheereAksenov, YuriYuriAksenovBekaert, JoostJoostBekaert2021-10-152021-10-152004-12https://imec-publications.be/handle/20.500.12860/9198Impact of hyper-NA reticle properties on ArF immersion lithographyProceedings paper