Truffert, VincentVincentTruffertPollentier, IvanIvanPollentierFoubert, PhilippePhilippeFoubertLazzarino, FredericFredericLazzarinoWilson, ChrisChrisWilsonErcken, MoniqueMoniqueErckenGronheid, RoelRoelGronheidDemuynck, StevenStevenDemuynckBuch, XavierXavierBuchAnno, YusukeYusukeAnno2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21639Patterning developments in spin-on hard mask systems for 30nm half pitch EUV technologyProceedings paper