Improving the growth of HfO2 ALD layers by modifying growth parameters and reducing precursors contaminants

Conard, ThierryThierryConardDelabie, AnneliesAnneliesDelabieVandervorst, WilfriedWilfriedVandervorst2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10252Improving the growth of HfO2 ALD layers by modifying growth parameters and reducing precursors contaminantsProceedings paper