Defect-free Si thinning by In Situ HCI vapour etching

Loo, RogerRogerLooCaymax, MattyMattyCaymaxRichard, OlivierOlivierRichardVerheyen, PeterPeterVerheyenCollaert, NadineNadineCollaert2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7820Defect-free Si thinning by In Situ HCI vapour etchingProceedings paper