Baklanov, MikhaïlMikhaïlBaklanovBadmaeva, I. A.I. A.BadmaevaAlves Donaton, RicardoRicardoAlves DonatonSveshnikova, L. L.L. L.SveshnikovaStorm, WolfgangWolfgangStormMaex, KarenKarenMaex2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1071The kinetics and mechanism of the etching of CoSi2 in HF-based solutionsJournal article