FEG-TEM analysis of the effects of Ge segregation and germane flux on the Ge profile across nm-scale SiGe layers, grown by both MBE and CVD

Benedetti, AlessandroAlessandroBenedettiNorris, D.J.D.J.NorrisHetherington, C.J.D.C.J.D.HetheringtonCullis, A.G.A.G.CullisRobbins, D.J.D.J.RobbinsWallis, D.J.D.J.Wallis2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7198FEG-TEM analysis of the effects of Ge segregation and germane flux on the Ge profile across nm-scale SiGe layers, grown by both MBE and CVDProceedings paper