Protein patterning on polycrystalline silicon–germanium via standard UV lithography for bioMEMS applications

Lenci, SilviaSilviaLenciTedeschi, LorenaLorenaTedeschiDomenici, ClaudioClaudioDomeniciLande, CaterinaCaterinaLandeNannini, AndreaAndreaNanniniPennelli, GiovanniGiovanniPennelliPieri, FrancescoFrancescoPieriSeveri, SimoneSimoneSeveri2021-10-182021-10-1820100928-4931https://imec-publications.be/handle/20.500.12860/17466Protein patterning on polycrystalline silicon–germanium via standard UV lithography for bioMEMS applicationsJournal article