Zhang, LipingLipingZhangLiazouli, RemiRemiLiazouliDussart, RamiRamiDussartLefaucheux, PhilippePhilippeLefaucheuxTillocher, ThomasThomasTillocherde Marneffe, Jean-FrancoisJean-Francoisde MarneffeDe Gendt, StefanStefanDe GendtMankelevich, YuriYuriMankelevichBaklanov, MikhaïlMikhaïlBaklanov2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21919Damage free cryogenic etching of porous organosilica ultralow-k filmMeeting abstract