Patterning challenges in setting up a 16nm node 6T-SRAM device using EUV lithography

Vandeweyer, TomTomVandeweyerDe Backer, JohanJohanDe BackerVersluijs, JankoJankoVersluijsTruffert, VincentVincentTruffertVerhaegen, StafStafVerhaegenErcken, MoniqueMoniqueErckenDusa, MirceaMirceaDusa2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/20024Patterning challenges in setting up a 16nm node 6T-SRAM device using EUV lithographyProceedings paper