Shickova, AdelinaAdelinaShickovaKaczer, BenBenKaczerSimoen, EddyEddySimoenVerheyen, PeterPeterVerheyenEneman, GeertGeertEnemanJurczak, GosiaGosiaJurczakAbsil, PhilippePhilippeAbsilMaes, HermanHermanMaesGroeseneken, GuidoGuidoGroeseneken2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12890Dielectric quality and reliability of FUSI/HfSiON devices with process induced strainJournal article