Pollentier, IvanIvanPollentierErcken, MoniqueMoniqueErckenEliat, AstridAstridEliatDelvaux, ChristieChristieDelvauxJaenen, PatrickPatrickJaenenRonse, KurtKurtRonse2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5581Front-end-of-line process development using 193-nm lithographyProceedings paper