Key factors to sustain the extension of a MHM-based integration scheme to medium and high porosity PECVD low-k materials

Travaly, YoussefYoussefTravalyVan Aelst, JokeJokeVan AelstTruffert, VincentVincentTruffertVerdonck, PatrickPatrickVerdonckDupont, TaniaTaniaDupontCamerotto, ElisabethElisabethCamerottoRichard, OlivierOlivierRichardBender, HugoHugoBenderCroes, KristofKristofCroesDe Roest, DavidDavidDe RoestVereecke, GuyGuyVereeckeClaes, MartineMartineClaesLe, Quoc ToanQuoc ToanLeKesters, ElsElsKestersVan Cauwenberghe, MarcMarcVan CauwenbergheBeynet, JulienJulienBeynetKaneko, S.S.KanekoStruyf, HerbertHerbertStruyfBaklanov, MikhaïlMikhaïlBaklanovMatsushita, K.K.MatsushitaKobayashi, N.N.KobayashiSprey, HesselHesselSpreyBeyer, GeraldGeraldBeyer2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14575Key factors to sustain the extension of a MHM-based integration scheme to medium and high porosity PECVD low-k materialsProceedings paper