Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO(2 )area-selective deposition

Nye, RachelRachelNyeVan Dongen, KaatKaatVan DongenOka, HironoriHironoriOkaDe Simone, DaniloDaniloDe SimoneParsons, Gregory N. N.Gregory N. N.ParsonsDelabie, AnneliesAnneliesDelabie2023-04-062023-03-012023-04-0620221932-5150WOS:000924949300011https://imec-publications.be/handle/20.500.12860/41209Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO(2 )area-selective depositionJournal article10.1117/1.JMM.21.4.041407WOS:000924949300011ATOMIC LAYER DEPOSITIONAREA-SELECTIVE DEPOSITIONGROWTH