Can we optimize the gate oxide quality of DRAM input/output pMOSFETs by a post-deposition treatment?

Simoen, EddyEddySimoenO'Sullivan, BarryBarryO'SullivanRitzenthaler, RomainRomainRitzenthalerDentoni Litta, EugenioEugenioDentoni LittaSchram, TomTomSchramHoriguchi, NaotoNaotoHoriguchiClaeys, CorCorClaeys2021-10-272021-10-2720190268-1242https://imec-publications.be/handle/20.500.12860/34010Can we optimize the gate oxide quality of DRAM input/output pMOSFETs by a post-deposition treatment?Journal articlehttps://iopscience.iop.org/article/10.1088/1361-6641/aaf4dc