Radisic, DunjaDunjaRadisicDemand, MarcMarcDemandChan, ShihshengShihshengChanDemuynck, StevenStevenDemuynckKumar, KaushikKaushikKumarMetz, AndrewAndrewMetzTeugels, LieveLieveTeugelsSun, JunlingJunlingSunSmith, JeffreyJeffreySmithSebaai, FaridFaridSebaaiHopf, TobyTobyHopfAltamirano Sanchez, EfrainEfrainAltamirano Sanchez2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/33848Plasma etch selectivity study and material screening for Self-Aligned Gate Contact (SAGC)Proceedings paperhttps://doi.org/10.1117/12.2505129