Xu, DongboDongboXuGillijns, WernerWernerGillijnsWu, StewartStewartWuJambaldinni, ShrutiShrutiJambaldinniKam, BenjaminBenjaminKamDe Silva, AnujaAnujaDe SilvaFenger, GermainGermainFenger2024-08-262024-06-152024-08-262024978-1-5106-7214-70277-786XWOS:001224292100018https://imec-publications.be/handle/20.500.12860/44037Improving OPC Model Accuracy of Dry Resist for Low k1 EUV PatterningProceedings paper10.1117/12.3010127978-1-5106-7215-4WOS:001224292100018