Profile control for low-k patterning using TaN and TiN metallic hardmasks

Struyf, HerbertHerbertStruyfHendrickx, DirkDirkHendrickxParaschiv, VasileVasileParaschivCampos Garcia, DianaDianaCampos GarciaMannaert, GeertGeertMannaertBoullart, WernerWernerBoullartVanhaelemeersch, SergeSergeVanhaelemeersch2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12956Profile control for low-k patterning using TaN and TiN metallic hardmasksOral presentationhttp://www.mrs.org/s_mrs/doc.asp?CID=8697&DID=193960