Influence of CH4/H2 reactive ion etching on electrical and optical properties of AlGaAs/GaAs and pseudomorphic AlGaAs/InGaAs/GaAs heterostructures

van Es, C. M.C. M.van EsEijkemans, T. J.T. J.EijkemansWolter, J. H.J. H.WolterPereira, RicardoRicardoPereiraVan Hove, MarleenMarleenVan HoveVan Rossum, MarcMarcVan Rossum2021-09-292021-09-291995https://imec-publications.be/handle/20.500.12860/938Influence of CH4/H2 reactive ion etching on electrical and optical properties of AlGaAs/GaAs and pseudomorphic AlGaAs/InGaAs/GaAs heterostructuresJournal article