Light, ScottScottLightStepanenko, NickolayNickolayStepanenkoGronheid, RoelRoelGronheidVan Roey, FriedaFriedaVan RoeyVan Den Heuvel, DieterDieterVan Den HeuvelGoethals, MiekeMiekeGoethals2021-10-152021-10-152004-03https://imec-publications.be/handle/20.500.12860/9203157-nm photoresist process optimization for a full-field scannerProceedings paper