Ultrathin EOT high-k/metal gate devices for future technologies: challenges, achievements and perspectives

Ragnarsson, Lars-AkeLars-AkeRagnarssonChiarella, ThomasThomasChiarellaTogo, MitsuhiroMitsuhiroTogoSchram, TomTomSchramAbsil, PhilippePhilippeAbsilHoffmann, Thomas Y.Thomas Y.Hoffmann2021-10-192021-10-1920110167-9317https://imec-publications.be/handle/20.500.12860/19649Ultrathin EOT high-k/metal gate devices for future technologies: challenges, achievements and perspectivesJournal articlehttp://www.sciencedirect.com/science/article/B6V0W-52H3RND-X/2/0a4f4c035832adcd613c77737a87a0a9