EUV lithography with the alpha demo tools: status and challenges

Harned, NoreenNoreenHarnedGoethals, MiekeMiekeGoethalsGroeneveld, RogierRogierGroeneveldKuerz, PeterPeterKuerzLowisch, MartinMartinLowischMeijer, HenkHenkMeijerMeiling, HansHansMeilingRonse, KurtKurtRonseRyan, JimJimRyanTittnich, MikeMikeTittnichVoorma, Harm-JanHarm-JanVoormaZimmmerman, JohnJohnZimmmermanMickan, UweUweMickanLok, SjoerdSjoerdLok2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12257EUV lithography with the alpha demo tools: status and challengesProceedings paper