Ni(Pt) silicide with improved thermal stability for application in DRAM PERI or RMG devices

Schram, TomTomSchramSpessot, AlessioAlessioSpessotRitzenthaler, RomainRomainRitzenthalerRosseel, ErikErikRosseelCaillat, ChristianChristianCaillatHoriguchi, NaotoNaotoHoriguchiFazan, PierrePierreFazan2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/23053Ni(Pt) silicide with improved thermal stability for application in DRAM PERI or RMG devicesMeeting abstract