The use of optical wafer inspection to qualify EUV mask defects and process defects: limitations and advantages of this technique

Van Den Heuvel, DieterDieterVan Den HeuvelJonckheere, RikRikJonckheereGoethals, MiekeMiekeGoethalsHendrickx, EricEricHendrickxCheng, ShauneeShauneeCheng2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/18158The use of optical wafer inspection to qualify EUV mask defects and process defects: limitations and advantages of this techniqueProceedings paper