Neisser, M.M.NeisserGrosev, G.G.GrosevMaenhoudt, MireilleMireilleMaenhoudtLepage, MurielMurielLepageStruyf, HerbertHerbertStruyf2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4610Applying a thin imaging resist system to substrates with topographyJournal article