Capturing the Effects of Spatial Process Variations in Silicon Photonic Circuits

Xing, YufeiYufeiXingDong, JiaxingJiaxingDongKhan, Muhammad UmarMuhammad UmarKhanBogaerts, WimWimBogaerts2023-05-242022-12-102023-05-2420232330-4022WOS:000889730400001https://imec-publications.be/handle/20.500.12860/40855Capturing the Effects of Spatial Process Variations in Silicon Photonic CircuitsJournal article10.1021/acsphotonics.2c01194WOS:000889730400001INVERSE DESIGNOPTIMIZATIONFABRICATIONTECHNOLOGY