Atomic-layer deposition of lutetium aluminate thin films for non-volatile memory applications

Adelmann, ChristophChristophAdelmannSwerts, JohanJohanSwertsConard, ThierryThierryConardBrijs, BertBertBrijsFranquet, AlexisAlexisFranquetHardy, AnAnHardyTielens, HildeHildeTielensOpsomer, KarlKarlOpsomerMoussa, AlainAlainMoussaVan Bael, MarliesMarliesVan BaelJurczak, GosiaGosiaJurczakKittl, JorgeJorgeKittlVan Elshocht, SvenSvenVan Elshocht2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/18447Atomic-layer deposition of lutetium aluminate thin films for non-volatile memory applicationsProceedings paper