Stress induced charge trapping effects in SiO2/Al2O3 gate stacks with TiN electrodes

Kerber, AndreasAndreasKerberCartier, E.E.CartierGroeseneken, GuidoGuidoGroesenekenMaes, HermanHermanMaesSchwalke, U.U.Schwalke2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7724Stress induced charge trapping effects in SiO2/Al2O3 gate stacks with TiN electrodesJournal article